发明名称 |
SEMICONDUCTOR WAFER CLEANING SYSTEM AND METHOD |
摘要 |
A microelectronic substrate handling device comprising first and second support structures spaced from each other, the first support structure having a series of upper teeth defining a series of upper notches extending along a length of the first support structure and a series of lower teeth defining a series of lower notches extending along a length of the first support structure, each of the upper and lower notches opening toward the second support structure, wherein the upper and lower notches are offset from each other by a predetermined offset distance so that an edge of a microelectronic device will fit differently within the upper and lower notches of the first support structure when supported between the first and second support structures.
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申请公布号 |
KR20050044443(A) |
申请公布日期 |
2005.05.12 |
申请号 |
KR20047007273 |
申请日期 |
2004.05.13 |
申请人 |
FSI INTERNATIONAL, INC. |
发明人 |
GAST, TRACY, A.;HERBST, TIM, W.;MACIEJ, TODD;SIEFERING, KEVIN, L.;WAGENER, THOMAS, J. |
分类号 |
H01L21/683;H01L21/00;H01L21/304;H01L21/673;(IPC1-7):H01L21/68;H01L21/306 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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