发明名称 ETCHING METHOD AND MANUFACTURING METHOD OF PIEZOELECTRIC DEVICE AND PIEZOELECTRIC VIBRATION PIECE UTILIZING THE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an etching method for applying wet etching to a corrosion resistance film with high accuracy by preventing formation of a galvanic battery in the case of applying the wet etching to the corrosion resistance film formed in the substrate of a piezoelectric material, and to provide a manufacturing method of a piezoelectric vibration piece utilizing the etching method, and a manufacturing method of a piezoelectric device using the piezoelectric vibration piece as above. <P>SOLUTION: The etching method includes processing the shape of the piezoelectric material by sequentially stacking a base metal 12 and a noble metal 13 on the surface of the piezoelectric material 11 to form the corrosion resistance film 14 and etching the exposed piezoelectric material formed partially exfoliating the corrosion resistance film. When the corrosion resistance film 14 is partially exfoliated before the shape processing of the piezoelectric material, etching liquid for much more decreasing a potential difference between different metals is used when the base metal is removed by the wet etching. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005123710(A) 申请公布日期 2005.05.12
申请号 JP20030353645 申请日期 2003.10.14
申请人 SEIKO EPSON CORP 发明人 NAKAGAWA TETSUO;SHIRAISHI SHIGERU;HOKIBARA AKI
分类号 H01L41/09;H01L41/18;H01L41/187;H01L41/22;H01L41/23;H01L41/29;H01L41/332;H03H3/02 主分类号 H01L41/09
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