METHOD AND DEVICE FOR EVALUATING RESOLUTION AND ELECTRON BEAM EXPOSING SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide resolution evaluating method/device for evaluating resolution of an exposure pattern transferred on a sample such as a semiconductor wafer by quantitative evaluation reference. SOLUTION: An image of the exposure pattern is picked up and two pattern edge positions in a picked-up image are decided based on a threshold on the pixel value of the picked-up image. A distance between the pattern edge positions is measured for a plurality of times by changing the threshold. The parameter of a prescribed approximate expression approximating a relation between the threshold and the distance between the pattern edge positions is decided, and resolution of the exposure pattern is evaluated based on the parameter. COPYRIGHT: (C)2005,JPO&NCIPI