发明名称 METHOD AND DEVICE FOR PATTERN DRAWING
摘要 PROBLEM TO BE SOLVED: To provide a pattern drawing method and a pattern drawing device which are capable of realizing uniform exposure without elongating a drawing time even if an energy variation is large in the pulse laser beam of a light source when a gray scale is reproduced through the frequency of overlapping spots in the laser beam drawing device using a digital mirror device. SOLUTION: Ultraviolet light L2 is made to penetrate slightly through a half mirror 8, the energy of the transmitted ultraviolet light is measured with a photodetector 9 to acquire energy data as to each pulse laser beam, and the frequency of overlapping spots in the gray scale is corrected taking an energy variation into consideration. That is, a gray scale correction device 10 calculates the gray scale for correcting an energy variation; based on an energy value obtained from the photodetector 9, and the ON/OFF operation of each micro mirror of the mirror device 1 is controlled on the basis of a calculation result. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005123234(A) 申请公布日期 2005.05.12
申请号 JP20030353433 申请日期 2003.10.14
申请人 OMI TADAHIRO 发明人 OMI TADAHIRO;YANAGIDA KIMIO;SUGAWA SHIGETOSHI;TAKEHISA KIWAMU
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
代理机构 代理人
主权项
地址