| 发明名称 |
Method for manufacturing CMOS image sensor |
| 摘要 |
The present invention discloses a method for manufacturing an image sensor which makes the boundaries between microlenses clear by forming a guide layer in advance and can increase the focal distance of light and the quantity of light by forming the spheres of the microlenses to have a constant height.
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| 申请公布号 |
US2005101049(A1) |
申请公布日期 |
2005.05.12 |
| 申请号 |
US20040983990 |
申请日期 |
2004.11.08 |
| 申请人 |
MAGNACHIP SEMICONDUCTOR, LTD. |
发明人 |
KIM HONG-IK |
| 分类号 |
H01L21/00;H01L27/146;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/00 |
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