发明名称 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <p>An array of individually controllable elements includes elements, each formed of a stack of layers of dielectric material. At least one layer is an electro-optical material. The at least one layer's refractive index for radiation that is plane polarized in a given direction can be changed by application of a voltage in order to change the reflection/transmission characteristic of the boundary between this layer and the adjacent layer.</p>
申请公布号 KR20050044295(A) 申请公布日期 2005.05.12
申请号 KR20040089871 申请日期 2004.11.05
申请人 ASML NETHERLANDS B.V. 发明人 BLEEKER, ARNO JAN
分类号 G02F1/03;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G02F1/03
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