| 发明名称 |
A METHOD OF ALIGNMENT BY USING INTERFEROMETER |
| 摘要 |
The present invention relates in general to detection of an alignment mark on a workpiece. More particularly, interferometry is applied to detect alignment signals from the surface of a workpiece such as a wafer or reticle. Other aspects of the present invention are reflected in the detailed description, figures and claims.
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| 申请公布号 |
KR20050044591(A) |
申请公布日期 |
2005.05.12 |
| 申请号 |
KR20047007851 |
申请日期 |
2004.05.24 |
| 申请人 |
MICRONIC LASER SYSTEMS AB |
发明人 |
SANDSTROM, TORBJORN |
| 分类号 |
H01L21/027;G01B9/02;(IPC1-7):G01B9/02;H01L21/02 |
主分类号 |
H01L21/027 |
| 代理机构 |
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