Lithographic apparatus and device manufacturing method

摘要

A transport structure is provided for moving a substrate and or mask relative to one another in a lithographic apparatus. The transport structure comprises a linear motor with a beam and a slide. The beam is hollow with a concave interior surface transverse to the transport direction. The slide is supported against the concave interior surface in at least two directions transverse to the transport direction. Preferably, the transporter part of the motor (an electromagnet) is located on the slide outside the interior space of the beam, between a support area for the substrate or mask. This makes it possible to reduce the torque due to the motor acceleration. Also the motor can be used to provide pretension for a gas bearing between the beam and the slide.