发明名称 POLISHING PAD HAVING AN ADVANTAGEOUS MICRO-TEXTURE
摘要 <p>A statistically uniform micro-texture on a polishing pad surface improves break-in preconditioning time, and is measured by:Land Surface Roughness, Ra, from about 0.01 mum to about 25 mum;Average Peak to Valley Roughness, Rtm, from about 2 mum to about 40 mum;Core roughness depth, Rk, from about 1 to about 10;Reduced Peak Height, Rpk, from about 0.1 to about 5;Reduced Valley Height, Rvk, from about 0.1 to about 10; andPeak density expressed as a surface area ratio, RSA, ([Surf.Area/(Area-1)]), 0.001 to 2.0.</p>
申请公布号 EP1320443(B1) 申请公布日期 2005.05.11
申请号 EP20010973123 申请日期 2001.09.18
申请人 ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. 发明人 PINHEIRO, BARRY, SCOTT;NAUGLER, STEVEN
分类号 B24B37/04;B24B37/26;B24D3/00;B24D13/14;(IPC1-7):B24D13/14 主分类号 B24B37/04
代理机构 代理人
主权项
地址