摘要 |
A ferroelectric capacitor adapted for a non-volatile semiconductor memory comprises a base substrate with an insulating surface (12), such as a semiconductor substrate formed with semiconductor elements and having a top insulator film (12), a lower electrode (20) formed on the insulating surface, an oxide ferroelectric layer (30) such as PET formed on the lower electrode, a first oxide upper electrode (41) formed on and in contact with the upper surface of the oxide ferroelectric layer, and a second oxide upper electrode (42) formed on the first oxide upper electrode, wherein one of the first and second oxide upper electrodes comprises SRO (SrRuOx) that contains at least 0.1at% additive and the other of the first and second oxide upper electrodes comprises IrOx. <??>In another embodiment SRO is replaced by CaRuOx or LaRuOx. In yet another embodiment SRO is replaced by LaNiOx or (La,Sr)COx. <IMAGE> |