| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus by which a processing liquid is applied stably and which is miniaturized, and to provide a substrate processing method by which the processing liquid is applied stably. <P>SOLUTION: A vertical carrying unit 7 and a resist application treatment unit CT are arranged with an interval h therebetween. Thus, the application treatment of a resist to a glass substrate G is prevented from becoming unstable due to the vibration of the vertical carrying unit 7. Surrounding the carrying unit 7, the resist application processing unit CT and reduced-pressure drying units 53b and 55b are arranged. Thus, the carrying unit 7, the reduced-pressure drying units 53b and 55b and the resist application processing unit CT are prevented from being arranged side by side in one direction, thereby miniaturizing an application development processing apparatus 1. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
