CHEMICALLY AMPLIFIED POSITIVE PHOTO RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

摘要

A chemically amplified positive photo resist composition which comprises an organic solvent and, dissolved therein, a resin being prepared through the reaction of a novolac resin or a hydroxystyrene resin with a crosslinking agent, being slightly soluble or insoluble in an alkaline aqueous solution and exhibiting enhanced solubility into an aqueous alkali solution in the presence of an acid, and (B) a compound generating an acid by the irradiation with a radiation, wherein it contains an acid component in a amount of 10 ppm or less. The chemically amplified positive photo resist composition can form a resist exhibiting good storage stability as a resist solution in a bottle.