发明名称 Optical element lithographic apparatus such optical element and device manufacturing method
摘要 The invention describes an optical element with a the top layer which is transmissive for EUV radiation with wavelength lambda in the range of 5-20 nm, and wherein the structure of the top layer is a structure having a rms roughness value equal to or larger than lambda /10 for spatial periods equal to or smaller than lambda /2. Such a structure promotes transmission through the top layer to the optical element. <IMAGE>
申请公布号 EP1530222(A1) 申请公布日期 2005.05.11
申请号 EP20040078050 申请日期 2004.11.05
申请人 ASML NETHERLANDS B.V. 发明人 BAKKER, LEVINUS PIETER
分类号 G02B1/11;G02B5/00;G21K1/06 主分类号 G02B1/11
代理机构 代理人
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