发明名称 |
Device for aligning masks in photolithography |
摘要 |
The present invention provides a device for aligning masks in photolithography, wherein in a first mask holder for a first mask at least one adapter for a second mask can be provided, so that masks being adapted to either the first mask holder or to the at least one adapter can be used in the device. The invention is advantageous in that it allows an easy, time and cost saving changeover from one mask size to at least one different mask size.
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申请公布号 |
US6891602(B2) |
申请公布日期 |
2005.05.10 |
申请号 |
US20020284888 |
申请日期 |
2002.10.31 |
申请人 |
SUESS MICRO TEC LITHOGRAPHY GMBH |
发明人 |
MAIER NIKOLAUS;SUESS RALF;BUTTINGER RICHARD |
分类号 |
G03F7/20;(IPC1-7):G03B27/62;G03B27/58;G03B27/42 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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