发明名称 Varactors for CMOS and BiCMOS technologies
摘要 Varactors are provided which have a high tunability and/or a high quality factor associated therewith as well as methods for fabricating the same. One type of varactor disclosed is a quasi hyper-abrupt base-collector junction varactor which includes a substrate having a collector region of a first conductivity type atop a subcollector region, the collector region having a plurality of isolation regions present therein; reach-through implant regions located between at least a pair of the isolation regions; a SiGe layer atop a portion of the substrate not containing a reach-through implant region, the SiGe layer having an extrinsic base region of a second conductivity type which is different from the first conductivity type; and an antimony implant region located between the extrinsic base region and the subcollector region. Another type of varactor disclosed is an MOS varactor which includes at least a poly gate region and a well region wherein the poly gate region and the well region have opposite polarities.
申请公布号 US6891251(B2) 申请公布日期 2005.05.10
申请号 US20020323022 申请日期 2002.12.18
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 COOLBAUGH DOUGLAS D.;DUNN JAMES S.;GORDON MICHAEL D.;HAMMAD MOHAMMED Y.;JOHNSON JEFFREY B.;SHERIDAN DAVID C.
分类号 H01L21/8222;H01L27/08;H01L29/93;H01L29/94;(IPC1-7):H01L29/93 主分类号 H01L21/8222
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