发明名称 Integrally formed bake plate unit for use in wafer fabrication system
摘要 A bake plate is integrally formed from a copper disk whose lower surface defines a desired heater element channel pattern that is filled with electrically conductive resistive material. Copper contamination is prevented by coating the structure. The channel pattern and fill material may be tailored to optimize thermal uniformity across the bake plate surface, and to produce a bake plate that may be mass produced with substantially uniform and repeatable thermal characteristics.
申请公布号 US6891134(B2) 申请公布日期 2005.05.10
申请号 US20030364125 申请日期 2003.02.10
申请人 ASML NETHERLANDS B.V. 发明人 MANDAL ROBERT P.
分类号 H01L21/00;H05B3/10;(IPC1-7):H05B3/68 主分类号 H01L21/00
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