发明名称 Method and apparatus for laser annealing configurations of a beam
摘要 An object of the present invention is to provide a laser annealing method and apparatus capable of performing uniform beam emission. By means of the present invention, uniform beam application to a sample can be achieved because a linear cross-sectional configuration can be created in an optical system with a beam having a Gaussian distribution while areas of strong light intensity are avoided by rotating the beam from a laser light source at a prescribed angle by means of rotating means even when the beam pattern of the beam from the laser light source has a non-uniform intensity distribution.
申请公布号 US6890839(B2) 申请公布日期 2005.05.10
申请号 US20020257460 申请日期 2002.10.11
申请人 ISHIKAWAJIMA-HARIMA HEAVY INDUSTRIES CO., LTD.;SEMICONDUCTOR ENERGY LAB 发明人 KAWAGUCHI NORIHITO;NISHIDA KENICHIRO;ISHII MIKITO;YAGI TAKEHITO;MASAKI MIYUKI;YOSHINOUCHI ATSUSHI;TANAKA KOICHIRO
分类号 A61B18/20;B23K26/06;B23K26/073;H01L21/268;H01S3/00;(IPC1-7):H01L21/00;H01L21/331;H01L21/20;H01L21/26 主分类号 A61B18/20
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