发明名称 |
Method and apparatus for laser annealing configurations of a beam |
摘要 |
An object of the present invention is to provide a laser annealing method and apparatus capable of performing uniform beam emission. By means of the present invention, uniform beam application to a sample can be achieved because a linear cross-sectional configuration can be created in an optical system with a beam having a Gaussian distribution while areas of strong light intensity are avoided by rotating the beam from a laser light source at a prescribed angle by means of rotating means even when the beam pattern of the beam from the laser light source has a non-uniform intensity distribution.
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申请公布号 |
US6890839(B2) |
申请公布日期 |
2005.05.10 |
申请号 |
US20020257460 |
申请日期 |
2002.10.11 |
申请人 |
ISHIKAWAJIMA-HARIMA HEAVY INDUSTRIES CO., LTD.;SEMICONDUCTOR ENERGY LAB |
发明人 |
KAWAGUCHI NORIHITO;NISHIDA KENICHIRO;ISHII MIKITO;YAGI TAKEHITO;MASAKI MIYUKI;YOSHINOUCHI ATSUSHI;TANAKA KOICHIRO |
分类号 |
A61B18/20;B23K26/06;B23K26/073;H01L21/268;H01S3/00;(IPC1-7):H01L21/00;H01L21/331;H01L21/20;H01L21/26 |
主分类号 |
A61B18/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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