发明名称 Low dielectric materials and methods of producing same
摘要 In accordance with the present invention, compositions and methods are provided in which the mechanical strength and durability of a precursor material having a plurality of pores is increased by a) providing a precursor material; b) treating the precursor material to form a nanoporous aerogel, preferably by using a supercritical drying process; c) providing a blending material having a reinforcing component and a volatile component; d) combining the nanoporous aerogel and the blending material to form an amalgamation layer; and e) treating the amalgamation layer to increase the mechanical strength of the layer by a substantial amount and to ultimately form a low dielectric material that can be utilized in various applications.
申请公布号 US6890641(B1) 申请公布日期 2005.05.10
申请号 US20030615812 申请日期 2003.07.08
申请人 HONEYWELL INTERNATIONAL INC. 发明人 MUKHERJEE SHYAMA;LEUNG ROGER;LAU KREISLER
分类号 B32B5/16;C08J9/28;H01L;H01L21/316;H05K1/16;(IPC1-7):C08J9/28 主分类号 B32B5/16
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