发明名称 |
Low dielectric materials and methods of producing same |
摘要 |
In accordance with the present invention, compositions and methods are provided in which the mechanical strength and durability of a precursor material having a plurality of pores is increased by a) providing a precursor material; b) treating the precursor material to form a nanoporous aerogel, preferably by using a supercritical drying process; c) providing a blending material having a reinforcing component and a volatile component; d) combining the nanoporous aerogel and the blending material to form an amalgamation layer; and e) treating the amalgamation layer to increase the mechanical strength of the layer by a substantial amount and to ultimately form a low dielectric material that can be utilized in various applications.
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申请公布号 |
US6890641(B1) |
申请公布日期 |
2005.05.10 |
申请号 |
US20030615812 |
申请日期 |
2003.07.08 |
申请人 |
HONEYWELL INTERNATIONAL INC. |
发明人 |
MUKHERJEE SHYAMA;LEUNG ROGER;LAU KREISLER |
分类号 |
B32B5/16;C08J9/28;H01L;H01L21/316;H05K1/16;(IPC1-7):C08J9/28 |
主分类号 |
B32B5/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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