DISSOLUTION INHIBITORS IN PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY
摘要
The invention relates to photoresist composition suitable for use at 10-165 nm comprising: (a) a polymeric binder (b) a photoactive compound (c) a dissolution inhibitor, the dissolution inhibitor comprising at least (i) two aromatic groups, (ii) fluorine and (iii) a blocked acid group which when unblocked has a pKa < 12. Preferred dissolution inhibitors are optionally blocked bisphenol derivates in which the bridging carbon atom is substituted with a fluorinated aliphatic group.
申请公布号
WO2005008336(A3)
申请公布日期
2005.05.06
申请号
WO2004NL00522
申请日期
2004.07.21
申请人
DSM IP ASSETS B.V.;SHAHAB, JAHROMI;DERKS, FRANCISCUS, JOHANNES, MARIE;LYAPUNOV, ANDREY, YAROSLAVOVICH