SYSTEM, METHOD AND APERTURE FOR OBLIQUE DEPOSITION

摘要

A deposition system 40 including a shadow mask 46 with one or more apertures 48, and a method for use are described for oblique deposition of tilted thin films with azimuthal symmetry. The deposition system 40 is used with physical vapor deposition processes to provide improved control of the angle of incidents of the flux combined with rotation of the substrate 44 to create titled thin films with improved properties compared to conventional oblique deposition techniques.