DEVICE FOR ADJUSTING THE ILLUMINATION DOSE ON A PHOTOSENSITIVE LAYER AND METHOD FOR THE MICROLITHOGRAPHIC PRODUCTION OF MICROSTRUCTURED COMPONENTS

摘要

A device for adjusting the illumination dose on a photosensitive layer (26), which is applied to a support (28) that can be displaced in a microlithographic projection exposure system (10) in a scanning direction (22) relative to a projection lens (16) of the projection exposure system (10), comprises an arrangement of a plurality of stop elements (52, 52') which are arranged next to one another perpendicularly to the scanning direction (22) and can respectively be displaced individually in the scanning direction (22) into a light field (60) produced by the projection exposure system (10). At least one stop element (52) is partially transparent for the projection light (14) being used in the projection exposure system (10), at least inside a subregion (69). This procedure substantially avoids pulse quantisation effects, which occur when using pulsed light sources (30) and can lead to inhomogeneous illumination of the reticle (20).