发明名称 SHOWER HEAD AND FILM-FORMING DEVICE USING THE SAME
摘要 <p>A shower head for supplying a raw material gas and a support gas for film formation into the treatment container of a film-forming device, comprising a shower head body with a gas injection surface (8). A first diffusion chamber (60) receiving and diffusing the raw material gas and second diffusion chambers (62) receiving and diffusing the support gas are formed in the shower head body. Raw material gas injection ports (10A) communicating with the first diffusion chamber and first support gas injection ports (10B) communicating with the second diffusion chambers are formed in the gas injection surface. Each of the first support gas injection ports (10B) is formed in a ring shape surrounding each of the raw material gas injection ports (10A) in proximity to each other.</p>
申请公布号 WO2005041285(A1) 申请公布日期 2005.05.06
申请号 WO2004JP15716 申请日期 2004.10.22
申请人 TOKYO ELECTRON LIMITED;AMIKURA, MANABU;IWATA, TERUO 发明人 AMIKURA, MANABU;IWATA, TERUO
分类号 C23C16/455;H01L21/31;(IPC1-7):H01L21/31 主分类号 C23C16/455
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