发明名称 |
Ion beam apparatus and sample processing method |
摘要 |
For the sake of realizing high throughput and high processing position accuracy in an ion beam apparatus, two kinds of ion beams for processing are prepared of which one is a focusing ion beam for high image resolution and an edge processing ion beam of large beam current for permitting a sectional edge portion to be processed sharply, whereby high processing position accuracy can be ensured even with a large current ion beam.
|
申请公布号 |
US2005092922(A1) |
申请公布日期 |
2005.05.05 |
申请号 |
US20040973304 |
申请日期 |
2004.10.27 |
申请人 |
MUTO HIROYUKI;ISHITANI TOHRU;MADOKORO YUICHI |
发明人 |
MUTO HIROYUKI;ISHITANI TOHRU;MADOKORO YUICHI |
分类号 |
G01N23/00;G21K7/00;H01J37/30;(IPC1-7):G21K7/00 |
主分类号 |
G01N23/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|