发明名称 Ferroelectric memory devices including protection adhesion layers and methods of forming the same
摘要 A ferroelectric memory device includes an interlayer dielectric layer and a a protection adhesion layer formed thereon. A buried contact extends through the protection adhesion layer and the interlayer dielectric layer. A lower electrode is on a portion of the protection adhesion layer that is adjacent to the buried contact and on the buried contact. A ferroelectric layer covers the lower electrode and the protection adhesion layer. An upper electrode overlaps the lower electrode and covers the ferroelectric layer. Related methods are also disclosed.
申请公布号 US2005094452(A1) 申请公布日期 2005.05.05
申请号 US20040721480 申请日期 2004.11.26
申请人 LEE KYU-MANN;PARK KUN-SANG;NAM SANG-DON 发明人 LEE KYU-MANN;PARK KUN-SANG;NAM SANG-DON
分类号 G11C7/00;H01L21/02;H01L21/768;H01L21/8246;H01L27/115;(IPC1-7):G11C7/00 主分类号 G11C7/00
代理机构 代理人
主权项
地址