| 发明名称 |
Abrasive liquid for metal and method for polishing |
| 摘要 |
An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.
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| 申请公布号 |
US2005095860(A1) |
申请公布日期 |
2005.05.05 |
| 申请号 |
US20040995494 |
申请日期 |
2004.11.24 |
| 申请人 |
UCHIDA TAKESHI;MATSUZAWA JUN;HOSHINO TETSUYA;KAMIGATA YASUO;TERAZAKI HIROKI;HONMA YOSHIO;KONDOH SEIICHI |
发明人 |
UCHIDA TAKESHI;MATSUZAWA JUN;HOSHINO TETSUYA;KAMIGATA YASUO;TERAZAKI HIROKI;HONMA YOSHIO;KONDOH SEIICHI |
| 分类号 |
C09G1/02;C23F3/00;C23F3/06;H01L21/321;(IPC1-7):H01L21/476;H01L21/302;H01L21/461 |
主分类号 |
C09G1/02 |
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