摘要 |
An exposure method includes forming a resist film on a substrate to be processed, forming a top anti-reflection coating on the resist film, and irradiating the resist film with exposure light through the top anti-reflection coating. Forming the top anti-reflection coating includes adjusting refractive index and thickness of the top anti-reflection coating to increase a ratio of s-polarized light to p-polarized light in the exposure light entering the resist film.
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