发明名称 Device for depositing thin layers with a wireless detection of process parameters
摘要 The invention relates to a device for depositing thin, especially crystalline layers on at least one substrate, especially a crystalline substrate. Said device comprises a substrate holder which is rotationally arranged in a reactor housing and at least one sensor for measuring a process parameter and a transferring means for transferring the measured values of the process parameter to an evaluation device. The inventive transfer takes place in a wireless manner. The transmitter is arranged inside the reactor housing and a receiver is arranged outside the reactor housing.
申请公布号 US2005092246(A1) 申请公布日期 2005.05.05
申请号 US20040922660 申请日期 2004.08.20
申请人 BAUMANN PETER;STRAUCH GERD;SCHUMACHER MARCUS;FRANKEN WALTER 发明人 BAUMANN PETER;STRAUCH GERD;SCHUMACHER MARCUS;FRANKEN WALTER
分类号 C23C16/458;C23C16/52;C30B25/16;(IPC1-7):C23C16/00 主分类号 C23C16/458
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