发明名称 |
Device for depositing thin layers with a wireless detection of process parameters |
摘要 |
The invention relates to a device for depositing thin, especially crystalline layers on at least one substrate, especially a crystalline substrate. Said device comprises a substrate holder which is rotationally arranged in a reactor housing and at least one sensor for measuring a process parameter and a transferring means for transferring the measured values of the process parameter to an evaluation device. The inventive transfer takes place in a wireless manner. The transmitter is arranged inside the reactor housing and a receiver is arranged outside the reactor housing.
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申请公布号 |
US2005092246(A1) |
申请公布日期 |
2005.05.05 |
申请号 |
US20040922660 |
申请日期 |
2004.08.20 |
申请人 |
BAUMANN PETER;STRAUCH GERD;SCHUMACHER MARCUS;FRANKEN WALTER |
发明人 |
BAUMANN PETER;STRAUCH GERD;SCHUMACHER MARCUS;FRANKEN WALTER |
分类号 |
C23C16/458;C23C16/52;C30B25/16;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/458 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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