发明名称 Two-dimensional spectroscopic system and film thickness measuring system
摘要 Light horizontally output from a light source 50 passes through a projection lens 51 and reaches a half mirror 52 . The light reflected by the half mirror 52 coaxially reaches the measurement object 43 through a objective lens 53 . The light reflected by the objective lens 53 provides an image at a image-taking unit 56 through a telecentric optical system on an object side comprising the objective lens 53 and an aperture stop 54 . The light to be input to the image-taking unit 56 passes through a spectral filter provided in a multi-spectral filter 55 . Here, the light source 50 and the aperture stop 54 are in an image-forming relation and the object 43 and the image-taking unit 56 are in the image-forming relation. In addition, a numerical aperture on an image side in a light-projecting optical system is greater than a numerical aperture on an object side in a light-receiving optical system, and the light source 50 outputs light which has a certain degree of divergence and forms an image having uniform light intensity at the aperture stop 54.
申请公布号 US2005094160(A1) 申请公布日期 2005.05.05
申请号 US20040938876 申请日期 2004.09.13
申请人 OMRON CORPORATION 发明人 MURAI HIDEYUKI;EKAWA KOICHI
分类号 G01B11/06;G01N21/27;G01N21/84;G02F1/13;H01L21/66;(IPC1-7):G01N21/00;G01B11/28 主分类号 G01B11/06
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