发明名称 Structure and method of making capped chips having vertical interconnects
摘要 Capped chips and methods of forming a capped chip are provided in which electrical interconnects are made by conductive elements which extend from bond pads of a chip at least partially through a plurality of through holes of a cap. The electrical interconnects may be solid, so as to form seals extending across the through holes. In some cases, stud bumps extend from the bond pads, forming parts of the electrical interconnects. In some cases, a fusible conductive medium forms a part of the electrical interconnects.
申请公布号 US2005095835(A1) 申请公布日期 2005.05.05
申请号 US20040949674 申请日期 2004.09.24
申请人 TESSERA, INC. 发明人 HUMPSTON GILES;TUCKERMAN DAVID B.;MCWILLIAMS BRUCE M.;HABA BELGACEM;MITCHELL CRAIG S.
分类号 H01L21/60;H01L23/04;H01L23/10;H01L23/485;H01L27/146;H03H3/007;H03H3/08;H03H9/10;(IPC1-7):H01L21/48 主分类号 H01L21/60
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