ATOMIC LAYER DEPOSITION APPARATUS AND PROCESS,申请号EP20020801694-传众专利搜索

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发明名称	ATOMIC LAYER DEPOSITION APPARATUS AND PROCESS
摘要
申请公布号	EP1444379(B1)	申请公布日期	2005.05.04
申请号	EP20020801694	申请日期	2002.10.15
申请人	MICRON TECHNOLOGY, INC.	发明人	CAMPBELL, PHILIP, H.;KUBISTA, DAVID, J.
分类号	C23C16/44;C23C16/455;H01L21/205;(IPC1-7):C23C16/44	主分类号	C23C16/44
代理机构		代理人
主权项
地址

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