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发明名称
METHOD FOR FORMING ISOLATION LAYER OF SEMICONDUCTOR DEVICE
摘要
申请公布号
KR20050041424(A)
申请公布日期
2005.05.04
申请号
KR20030076591
申请日期
2003.10.31
申请人
HYNIX SEMICONDUCTOR INC.
发明人
PARK, JEONG HOON
分类号
H01L21/76;(IPC1-7):H01L21/76
主分类号
H01L21/76
代理机构
代理人
主权项
地址
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