发明名称 |
MULTIPLEXER FOR LASER LITHOGRAPHY |
摘要 |
A laser lithography system in which two or more lasers provide laser illumination for two or more lithography exposure tools through a laser beam multiplexer. The mulitplexer contain several mirror devices each having a multi-reflectance mirror with surfaces of different reflectance and an adjusting mechanism for positioning one of the surfaces to intersect a laser beam from at least one of the lasers and direct a portion of it to at least one of the exposure tools. |
申请公布号 |
EP1095304(A4) |
申请公布日期 |
2005.05.04 |
申请号 |
EP19990931850 |
申请日期 |
1999.06.22 |
申请人 |
CYMER, INC. |
发明人 |
OZARSKI, ROBERT, G.;ERSHOV, ALEXANDER I. |
分类号 |
G02B26/08;G03F7/20;H01L21/027 |
主分类号 |
G02B26/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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