发明名称 PRODUCTION PROCESS OF COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY
摘要 <p>Efficient and reproducible production of a copolymer for lithography, which has stable quality, with little lot-to-lot variations, and is suited for film-forming and coating compositions. Radical polymerization of a monomer, which contains at least one ethylenic double bond, with an initiator, in a solvent, and purification of the reaction mixture by precipitation and filtration, in a hermetically-closable single vessel divided by a filter medium, into a first section provided with fluid feeding means and agitating means, and a second section with fluid drawing means. Feeding the reaction mixture from the fluid feeding means into the first section of the vessel, containing a poor solvent, and contacting the reaction mixture with the poor solvent to precipitate a solid; and filtering the resulting fluid, containing the precipitated solid, through the filter medium, drawing the resultant filtrate through the fluid drawing means, and then separating the precipitated solid.</p>
申请公布号 KR20050041892(A) 申请公布日期 2005.05.04
申请号 KR20040085117 申请日期 2004.10.23
申请人 MARUZEN PETROCHEMICAL CO., LTD. 发明人 KATO, ICHIRO;YAMAGISHI, TAKANORI;YAMAGUCHI, SATOSHI
分类号 C08F6/00;C08F6/12;C08F118/02;C08F220/06;G03F7/004;G03F7/039;G03F7/09;(IPC1-7):C08F220/06 主分类号 C08F6/00
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