发明名称 Monitored laser shock peening
摘要 <p>A pulse laser (20) is configured for projecting a pulsed laser beam (22) at a target site (24) on a fluid film (18) atop a workpiece (12) for laser shock peening the workpiece. The fluid film is monitored by a probe laser (36) which projects a probe laser beam (38) at the target site, and an optical detector (40) which detects reflection of the probe beam from the target site. The pulse laser is coordinated by the detector in order to emit the pulsed beam in response to the condition of the monitored film.</p>
申请公布号 EP1528110(A1) 申请公布日期 2005.05.04
申请号 EP20040256633 申请日期 2004.10.27
申请人 GENERAL ELECTRIC COMPANY 发明人 WARREN, RICHARD EDWIN, JR.;STAVER, PHILLIP RANDALL
分类号 G01B11/06;B23K26/00;B23K26/03;B23K26/18;C21D10/00;C23C26/00;(IPC1-7):C21D10/00 主分类号 G01B11/06
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