发明名称 Light sensitive compsn. e.g. for resist film - comprising an alkali soluble polymer with an alkali-soluble gp. protected by an acid-labile gp., a photogenerator of acid and a miscibility improver
摘要 <p>A light sensitive compsn. comprises (1) (a) a polymer obtd. by protecting the alkali-soluble gp. of an alkali soluble polymer with an acid-labile gp., (b) a cpd. (I) which releases an acid upon irradiation with light; and (c) at least one cpd. selected from imidazole cpds., alanine cpds., adenine cpds., adenosine cpds., and quat. ammonium salt cpds. which increase the miscibility in a resist film. Other claimed light-sensitive compsns. contain (2) (a) a polymer obtd. by protecting the alkali-soluble gp. of an alkali soluble polymer with an acid-labile gp., (b) a cpd. (I) which releases an acid upon irradiation with light; and (c) a phenol cpd.; and (3) (a) a polymer obtd. by protecting the alkali-soluble gp. of an alkali soluble polymer with an acid-labile gp., (b) a cpd. (I) which releases an acid upon irradiation with light; (c) at least one cpd. selected from imidazole cpds., alanine cpds., adenine cpds., adenosine cpds., and quat. ammonium salt cpds. which increase the miscibility in a resist film and (d) a phenol cpd. Also claimed is a method of producing a structure.</p>
申请公布号 DE4447786(B4) 申请公布日期 2005.05.04
申请号 DE19944447786 申请日期 1994.03.11
申请人 KABUSHIKI KAISHA TOSHIBA, KAWASAKI 发明人 HAYASHI, TAKAO;ONISHI, YASUNOBU;SATO, KAZUO;CHIBA, KENJI;MIYAMURA, MASATAKA
分类号 C08K5/13;C08K5/17;C08K5/3472;G03F7/004;G03F7/039;(IPC1-7):G03F7/039;G03F7/38 主分类号 C08K5/13
代理机构 代理人
主权项
地址