发明名称 |
Light sensitive compsn. e.g. for resist film - comprising an alkali soluble polymer with an alkali-soluble gp. protected by an acid-labile gp., a photogenerator of acid and a miscibility improver |
摘要 |
<p>A light sensitive compsn. comprises (1) (a) a polymer obtd. by protecting the alkali-soluble gp. of an alkali soluble polymer with an acid-labile gp., (b) a cpd. (I) which releases an acid upon irradiation with light; and (c) at least one cpd. selected from imidazole cpds., alanine cpds., adenine cpds., adenosine cpds., and quat. ammonium salt cpds. which increase the miscibility in a resist film. Other claimed light-sensitive compsns. contain (2) (a) a polymer obtd. by protecting the alkali-soluble gp. of an alkali soluble polymer with an acid-labile gp., (b) a cpd. (I) which releases an acid upon irradiation with light; and (c) a phenol cpd.; and (3) (a) a polymer obtd. by protecting the alkali-soluble gp. of an alkali soluble polymer with an acid-labile gp., (b) a cpd. (I) which releases an acid upon irradiation with light; (c) at least one cpd. selected from imidazole cpds., alanine cpds., adenine cpds., adenosine cpds., and quat. ammonium salt cpds. which increase the miscibility in a resist film and (d) a phenol cpd. Also claimed is a method of producing a structure.</p> |
申请公布号 |
DE4447786(B4) |
申请公布日期 |
2005.05.04 |
申请号 |
DE19944447786 |
申请日期 |
1994.03.11 |
申请人 |
KABUSHIKI KAISHA TOSHIBA, KAWASAKI |
发明人 |
HAYASHI, TAKAO;ONISHI, YASUNOBU;SATO, KAZUO;CHIBA, KENJI;MIYAMURA, MASATAKA |
分类号 |
C08K5/13;C08K5/17;C08K5/3472;G03F7/004;G03F7/039;(IPC1-7):G03F7/039;G03F7/38 |
主分类号 |
C08K5/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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