| 摘要 |
A novel apparatus and method for calibrating the gap distance between adjacent scrubber brushes with the frictional force of the brushes against a wafer, is disclosed. The apparatus includes a support frame, at least one pair of load cells carried by the support frame, at least one test plate operably engaging the load cells, and at least one electronic indicator operably connected to the load cells, respectively, for indicating a force exerted on the load cells by the test plate. The method includes placing at least one test plate between the adjacent scrubber brushes, rotating the scrubber brushes against the test plate, determining the frictional force of each brush against the plate, and adjusting the gap distance between the brushes to obtain a desired frictional force for the scrubber cleaning of production wafers.
|
