发明名称 Reactor configuration and method for producing it
摘要 A reactor configuration contains a housing connected to a silicon wafer. The silicon wafer has pores extending from a first main area of the silicon wafer into an interior of the silicon wafer, preferably as far as a second main area of the silicon wafer. A catalyst layer at least partly covers the surface of the pores.
申请公布号 US6887437(B1) 申请公布日期 2005.05.03
申请号 US20000718902 申请日期 2000.11.22
申请人 INFINEON TECHNOLOGIES AG 发明人 LEHMANN VOLKER;OTTOW STEFAN;STENGL REINHARD;REISINGER HANS;WENDT HERMANN
分类号 B01D50/00;B01D53/34;B01J19/00;C23C16/02;C23C16/26;(IPC1-7):B01D50/00 主分类号 B01D50/00
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