发明名称 |
Reactor configuration and method for producing it |
摘要 |
A reactor configuration contains a housing connected to a silicon wafer. The silicon wafer has pores extending from a first main area of the silicon wafer into an interior of the silicon wafer, preferably as far as a second main area of the silicon wafer. A catalyst layer at least partly covers the surface of the pores.
|
申请公布号 |
US6887437(B1) |
申请公布日期 |
2005.05.03 |
申请号 |
US20000718902 |
申请日期 |
2000.11.22 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
LEHMANN VOLKER;OTTOW STEFAN;STENGL REINHARD;REISINGER HANS;WENDT HERMANN |
分类号 |
B01D50/00;B01D53/34;B01J19/00;C23C16/02;C23C16/26;(IPC1-7):B01D50/00 |
主分类号 |
B01D50/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|