发明名称 High voltage transistors with graded extension
摘要 High voltage transistors with high breakdown voltages are provided. These high voltage transistors are formed with graded drain extension regions. The concentration of charge carriers increases farther away from the gate across each drain extension region, causing severe electric fields to be moved away from the gate. Methods and structures of the present invention may be used to increase a transistor's breakdown voltage to the theoretical limit of the device. High voltage transistors with graded extension regions may be p-channel or n-channel MOSFETs.
申请公布号 US6888207(B1) 申请公布日期 2005.05.03
申请号 US20030683922 申请日期 2003.10.10
申请人 LINEAR TECHNOLOGY CORPORATION 发明人 HEBERT FRANCOIS
分类号 H01L21/336;H01L29/06;H01L29/08;H01L29/10;H01L29/423;H01L29/78;(IPC1-7):H01L29/72 主分类号 H01L21/336
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