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发明名称
METHOD FOR FABRICATING CONTACT HOLE IN SEMICONDUCTOR DEVICE
摘要
申请公布号
KR100487415(B1)
申请公布日期
2005.05.03
申请号
KR20000086533
申请日期
2000.12.30
申请人
发明人
分类号
H01L21/28;(IPC1-7):H01L21/28
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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