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发明名称
作为后化学机械平坦化处理的含有界面活性剂之加工溶液
摘要
使用包含一或更多界面活性剂的加工溶液使半导体装置制造时的缺陷数目减少。有些较佳的具体例中,在展开CMP加工的期间或之后作为冲洗溶液时,本发明的加工溶液可使缺陷减少。同时揭示一种使用本发明的加工溶液使复数个后CMP加工基材上的缺陷数目减少之方法。
申请公布号
TW200514845
申请公布日期
2005.05.01
申请号
TW093131394
申请日期
2004.10.15
申请人
气体产品及化学品股份公司
发明人
张鹏;布伦达法伊洛斯
分类号
C11D7/00
主分类号
C11D7/00
代理机构
代理人
陈展俊;林圣富
主权项
地址
美国
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