发明名称 SELF-ALIGNED MULTI-LAYER METAL FILM ELECTRO-LENS OF A MICRO-COLUMN ELECTRON BEAM APPARATUS AND METHOD FOR FABRICATING SAME
摘要 Provided is an electron beam lens for a micro-column electron beam apparatus and a method of manufacturing the same. A photosensitive glass substrate is used as a base isolation substrate and a thin metal film is grown by a plating method. Holes through which electron beam passes are formed by a lift off method after forming a resist pattern shaped as a hole on a seed metal layer and plating the thin metal film.
申请公布号 KR20050039458(A) 申请公布日期 2005.04.29
申请号 KR20030074927 申请日期 2003.10.25
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 CHOI, SANG KUK;KIM, DAE YONG
分类号 G02B3/00;H01J1/02;H01J3/18;H01J9/02;H01J9/14;H01J37/12;(IPC1-7):G02B3/00 主分类号 G02B3/00
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