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发明名称
SUBSTRATE PROCESSING APPARATUS FOR PERFORMING EXPOSURE PROCESS IN GAS ATMOSPHERE
摘要
申请公布号
KR20050039771(A)
申请公布日期
2005.04.29
申请号
KR20050016172
申请日期
2005.02.25
申请人
NEC LCD TECHNOLOGIES, LTD.
发明人
IIO YOSHIHIDE;IKEDA MASAKI;KIDO SHUSAKU
分类号
H01L21/027;H01L21/00;H01L21/20;(IPC1-7):H01L21/20
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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