发明名称 METHOD AND APPARATUS FOR ANALYZING FILM STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a film structure analyzing method constituted so as to analyze the structure of a film structure comprising a single-layer film or a multilayered film and analyzing a plurality of measuring data, which is obtained by measuring the same film sample under a measuring condition different in at least either one of resolving power and a dynamic range, at the same time to determinate the film structure. SOLUTION: In analyzing the film structure by fitting simulation operated data to measured data obtained by measuring X-ray reflectivity, a film structure analyzing result is obtained with high precision by preventing the analyzing result by fitting from falling into a local solution. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005114475(A) 申请公布日期 2005.04.28
申请号 JP20030347224 申请日期 2003.10.06
申请人 RIGAKU CORP 发明人 ITO YOSHIYASU;OMOTE KAZUHIKO
分类号 G01N23/201;G01N23/083;G01N23/20;(IPC1-7):G01N23/201 主分类号 G01N23/201
代理机构 代理人
主权项
地址