METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING MASTER INFORMATION CARRIER, METHOD FOR MANUFACTURING MAGNETIC RECORDING MEDIUM, METHOD FOR MANUFACTURING MAGNETIC RECORDING AND REPRODUCING APPARATUS, AND MAGNETIC RECORDING AND REPRODUCING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a resist pattern that allows a fine pattern to be formed by preventing undesirable diffraction of light in exposure. SOLUTION: The method includes the steps of: forming a resist film 2 on the surface of a substrate 1; forming a protrusion 252 and an air-evacuating recess 251 on the resist film 2 by exposing/developing the resist film 2; bringing the resist film 2 and a photomask 31 on which a predetermined pattern is formed into close contact with each other by performing evacuation through the air-evacuating recess 251 while the photomask 31 is superimposed on the resist film 2; and exposing the resist film 2 in a part corresponding to the pattern of the photomask 31, wherein the pattern of the photomask 31 is formed so as to extend from a region facing the protrusion 252 to a region facing the air-evacuation recess 251 on the resist film. COPYRIGHT: (C)2005,JPO&NCIPI