EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE

摘要

An exposure apparatus (EX) is disclosed wherein an exposure of a substrate (W) is carried out by forming an immersion region (AR2) between a projection optical system (PL) and the substrate (W) and projecting an image of a pattern (PA) onto the substrate (W) through a liquid (L) forming the immersion region (AR2) and the projection optical system (PL). The exposure apparatus (EX) comprises a liquid supply unit (15) for supplying the liquid (L) onto the substrate (W), a first piping unit (14a) for guiding the liquid (L) to the liquid supply unit (15), and a second piping unit (14b) which is connected with the first piping unit (14a) and the liquid supply unit (15) for collecting the liquid (L) which is not supplied to the liquid supply unit (15) from the first piping unit (14a). By having such a structure, the immersion exposure apparatus is provided with a liquid supply mechanism which enables to prevent intrusion of contaminants while suppressing temperature change in the liquid to be supplied between the projection optical system and the substrate. Also disclosed are an exposure method and a method for manufacturing a device.