发明名称 |
SURFACE-PROTECTING SHEET AND SEMICONDUCTOR WAFER LAPPING METHOD |
摘要 |
<p>A surface-protecting sheet not producing any dimple when a wafer is lapped to an extremely small thickness, nor causing damage to and contamination of the wafer where even high bumps are arranged at high density, nor leaving any adhesive on the root portions of the bumps after the sheet is peeled. A method for lapping a semiconductor wafer is also disclosed. The surface-protecting sheet is used for lapping the back of a semiconductor wafer and is characterized in that one side of a base sheet of the surface-protecting sheet has an opening portion having a diameter smaller than that of the semiconductor wafer to which the surface-protecting sheet is stuck and a portion which is provided around the opening portion and on which an adhesive layer is formed.</p> |
申请公布号 |
WO2005038894(A1) |
申请公布日期 |
2005.04.28 |
申请号 |
WO2004JP15131 |
申请日期 |
2004.10.14 |
申请人 |
LINTEC CORPORATION;NAGAMOTO, KOICHI;OHASHI, HITOSHI;TAKAHASHI, KAZUHIRO |
发明人 |
NAGAMOTO, KOICHI;OHASHI, HITOSHI;TAKAHASHI, KAZUHIRO |
分类号 |
C09J7/02;C09J201/00;H01L21/304;H01L21/68;(IPC1-7):H01L21/304 |
主分类号 |
C09J7/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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