发明名称 |
SILANE COMPOUND, POLYSILOXANE AND RADIATION-SENSITIVE RESIN COMPOSITION |
摘要 |
<p>Disclosed is a novel polysiloxane which is suitable for a resin component in a chemically amplified resist that is particularly excellent in I-D bias, depth of focus (DOF) and the like. Also disclosed are a novel silane compound useful as a raw material for synthesizing such a polysiloxane, and a radiation-sensitive resin composition containing such a polysiloxane. The silane compound is represented by the following formula (I). (I) The polysiloxane has a constitutional unit represented by the following formula (1). (1) (R represents an alkyl group; R<1> and R<2> respectively represent a fluorine atom, a lower alkyl group or a lower fluorinated alkyl group; n is 0 or 1; k is 1 or 2; and i is an integer of 0-10.) The radiation-sensitive resin composition contains such a polysiloxane and a radiation-sensitive acid generator.</p> |
申请公布号 |
WO2005037846(A1) |
申请公布日期 |
2005.04.28 |
申请号 |
WO2004JP15150 |
申请日期 |
2004.10.14 |
申请人 |
JSR CORPORATION;NISHIMURA, ISAO;YAMAHARA, NOBORU;TANAKA, MASATO;SHIMOKAWA, TSUTOMU |
发明人 |
NISHIMURA, ISAO;YAMAHARA, NOBORU;TANAKA, MASATO;SHIMOKAWA, TSUTOMU |
分类号 |
C07F7/08;C07F7/18;C08G77/14;C08G77/24;G03F7/004;G03F7/075;(IPC1-7):C07F7/18;G03F7/039;H01L21/027 |
主分类号 |
C07F7/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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