| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mild acidic dielectric thin film forming agent, a manufacturing method for the dielectric thin film forming agent, a dielectric thin film and a method for forming the dielectric thin film. <P>SOLUTION: This dielectric thin film forming agent is a mild acidic solution containing alkaline earth metal salt, ammonium titanium peroxocitrate, and hydroxycarboxylic acid and forming a titanium compound. Since the dielectric thin film forming agent does not contain hydrochloric acid, hydrogen chloride gas is not generated even if it is heat-treated, and safe film forming work can be done without requiring a special device. By performing two step heat-treatment, the dielectric thin film having performance comparable to other methods can be formed. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
