发明名称 Method of lift-off microstructuring deposition material on a substrate, substrates obtainable by the method, and use thereof
摘要 Methods and apparatus for lift-off microstructuring deposition material, here alternate hydrophilic ( 601 ) and hydrophobic ( 602 ) letters, on a substrate; a method comprising deposition of polymeric material by plasma polymerisation deposition of monomers of substituted benzenes, (halo)aliphatic compounds, or a combination thereof; another method comprising deposition of polymeric material by plasma polymerisation deposition of monomers of vinyls, substituted vinyls, acrylics, silanes, and phosphites, or a combination thereof; still another method comprising deposition of polymeric material by plasma polymerisation deposition of monomers wherein said plasma is generated by a multiple phase AC supply, or DC supply; and substrates and devices prepared by lift-off microstructuring using plasma polymerisation deposition of monomers according to such methods. Scale A indicates about 100mu.
申请公布号 US2005089803(A1) 申请公布日期 2005.04.28
申请号 US20040478947 申请日期 2004.12.02
申请人 BOUAIDAT SALIM;JONSMANN JACQUES;WINTHER-JENSEN BJORN;CHRISTENSEN SORON F. 发明人 BOUAIDAT SALIM;JONSMANN JACQUES;WINTHER-JENSEN BJORN;CHRISTENSEN SORON F.
分类号 G03F7/26;B05D7/24;C08G83/00;C12M1/40;C12N5/00;G03F7/00;G03F7/40;(IPC1-7):G03C5/00;H01L21/302 主分类号 G03F7/26
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