发明名称 |
APPARATUS FOR ELECTROLESS DEPOSITION |
摘要 |
Embodiments of the invention generally provide a fluid processing platform. The platform includes a mainframe having a substrate transfer robot, at least one substrate cleaning cell on the mainframe, and at least one processing enclosure. The processing enclosure includes a gas supply positioned in fluid communication with an interior of the processing enclosure, a first fluid processing cell positioned in the enclosure, a first substrate head assembly positioned to support a substrate for processing in the first fluid processing cell, a second fluid processing cell positioned in the enclosure, a second head assembly positioned to support a substrate for processing in the second fluid processing cell, and a substrate shuttle positioned between the first and second fluid processing cells and being configured to transfer substrates between the fluid processing cells and the mainframe robot. |
申请公布号 |
WO2005038094(A2) |
申请公布日期 |
2005.04.28 |
申请号 |
WO2004US34456 |
申请日期 |
2004.10.15 |
申请人 |
APPLIED MATERIALS, INC.;LUBOMIRSKY, DMITRY;SHANMUGASUNDRAM, ARULKUMAR;PANCHAM, IAN, A.;LOPATIN, SERGEY |
发明人 |
LUBOMIRSKY, DMITRY;SHANMUGASUNDRAM, ARULKUMAR;PANCHAM, IAN, A.;LOPATIN, SERGEY |
分类号 |
B05C3/00;B05C19/02;C23C18/16;C23C18/28;C23F1/00;C25D7/12;H01L21/288;H01L21/768 |
主分类号 |
B05C3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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